Scanning Tunneling Microscope with a Displacement Correction Mechanism.
نویسندگان
چکیده
منابع مشابه
Fabrication of silicon nanostructures with a scanning tunneling microscope
A technique is presented for fabricating Si nanostructures with a scanning tunneling microscope operated in air. The process involves the direct chemical modification of a H-passivated Si( 100) surface and a subsequent liquid etch. The chemically modified portions of the surface can withstand a deep ( > 100 nm) liquid etch of the unmodified regions with no etch degradation of the modified surfa...
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ژورنال
عنوان ژورنال: Journal of the Japan Society for Precision Engineering
سال: 1993
ISSN: 1882-675X,0912-0289
DOI: 10.2493/jjspe.59.95